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URL: https://www.labx.com/item/kla-tencor-p-10-surface-profiler/LV40252132
Proper Citation: Tencore KLA P-10 Surface Profiler (RRID:SCR_020535)
Description: Computer controlled manual wafer load profilometer with Max wafer size of 8"/200mm that measures roughness, waviness, step height, and other surface characteristics. Capabilities of this instrument include: Measurement of vertical features ranging from under 100Ã… (0.4 min.) to approximately 300 �m (11 mils), with a vertical resolution of 0.5, 2, or 10Ã…, A virtually unlimited number of data points per profile guarantee that the horizontal resolution is limited by the stylus radius and not by the number of data points, Measurement of many roughness and waviness parameters, with user-selectable cutoff filters to isolate roughness and waviness, Ability to fit and level a scan, allowing accurate step height measurements on curved surfaces, and the Ability to detect the edge or apex of a profile feature, allowing automated data analysis relative to the feature. The KLA P-10 to repeat a scan up to ten times and automatically calculate the average, thereby minimizing the effects of environmental noise on measurements. KLA-Tencor P10 can profile a variety of materials including: Semiconductor wafers, Thin-film heads, Precision-machined and polished surfaces, Ceramics for micro-electronics, Glass for flat panel displays, and Optical surfaces
Resource Type: instrument resource
Keywords: Tencore, Surface Profiler, Instrument Equipment, USEDit
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