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URL: https://plasma.oxinst.com/products/rie/plasmapro-800
Proper Citation: Oxford PlasmaPro 800 RIE Plasma Technology (RRID:SCR_020398)
Description: PlasmaPro 800 offers solution for reactive ion etching processes on large wafer batches and 300mm wafers, in compact footprint, open loading system. Large wafer platen allows for production scale batch processing and 300mm wafer handling.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
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