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URL: https://plasma.oxinst.com/products/cvd/plasmapro-100-nano
Proper Citation: Oxford PlasmaPro 100 Nano Plasma Technology (RRID:SCR_020384)
Description: Chemical Vapour Deposition and PECVD tools for growth of 1D and 2D nanomaterials and heterostructures. PlasmaPro 100 Nano delivers performance growth of nanomaterials with in situ catalyst activation and process control, with flexible temperatures up to 1,200 degrees C.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
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