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URL: https://plasma.oxinst.com/products/icp-etching/80icp
Proper Citation: Oxford PlasmaPro 80 ICP Plasma Technology (RRID:SCR_020377)
Description: PlasmaPro 80 ICP is compact, small footprint system offering ICP etch solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
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