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URL: https://plasma.oxinst.com/products/pecvd/plasmapro-800-pecvd#product-information-tabs
Proper Citation: Oxford Instruments P 80 Plasma Etcher (RRID:SCR_020364)
Description: PlasmaPro 800 offers a flexible solution for Plasma Enhanced Chemical Vapour Deposition (PECVD) processes on large wafer batches and 300mm wafers, in a compact footprint, open-loading system. The large wafer platen allows for production scale batch processing and 300mm wafer handling.
Resource Type: instrument resource
Keywords: Oxford, Plasma Etcher, Instrument Equipment, USEDit
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