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URL: https://plasma.oxinst.com/products/ion-beam/ionfab
Proper Citation: Oxford Ionfab Ion Beam Plasma Technology (RRID:SCR_020358)
Description: Ion beam etch and deposition system is used for high quality material processing. Systems have flexible hardware options including open load, single substrate load lock, and cassette to cassette.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
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