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Proper Citation: Jeol JBX-9500FS Electron Beam Lithography System (RRID:SCR_020171)
Description: Electron beam lithography system that is versatile in its applications from basic research of elements to test production of optical elements to research and development for masks for high accelerating voltage exposure.
Resource Type: instrument resource
Keywords: Jeol, JEOL, Electron Beam Lithography System, Instrument Equipment, USEDit,
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